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1

Electrical reliability aspects of HfO2 high-k gate dielectrics with TaN metal gate electrodes under constant voltage stress

S. Chatterjee, Y. Kuo, J. Lu, J.-Y. Tewg, P. Majhi

Journal:

Microelectronics Reliability

Year:

2006

Language:

english

File:

PDF, 244 KB

english, 2006

2

Effects of the TaNx interface layer on doped tantalum oxide high-k films

J. Lu, Yue. Kuo, J.-Y. Tewg, B. Schueler

Journal:

Year:

2004

Language:

english

File:

PDF, 288 KB

english, 2004

3

On the Scaling of Flash Cell Spacer for Gate Disturb and Charge Retention Optimization

Yung-Huei Lee, McMahon, W., Lu, Y.-L.R., Tewg, J.-Y.J., Ma, S.T.

Journal:

IEEE Transactions on Electron Devices

Year:

2009

Language:

english

File:

PDF, 630 KB

english, 2009

4

[IEEE 2005 IEEE International Reliability Physics Symposium, 2005. Proceedings. 43rd Annual. - San Jose, CA, USA (April 17-21, 2005)] 2005 IEEE International Reliability Physics Symposium, 2005. Proceedings. 43rd Annual. - Effects of post metallization annealing on the electrical reliability of ultra-thin HfO/sub 2/ films with MoN and WN gate electrodes

Chatterjee, S., Kuo, Y., Lu, J., Tewg, J.-Y., Majhi, P.

Year:

2005

Language:

english

File:

PDF, 439 KB

english, 2005

5

[IEEE 2007 International Symposium on VLSI Technology, Systems and Applications (VLSI-TSA) - Hsinchu, Taiwan (2007.04.23-2007.04.25)] 2007 International Symposium on VLSI Technology, Systems and Applications (VLSI-TSA) - A Self-Aligned Contact Architecture with W-Gate for NOR Flash Technology Scaling

Blosse, A., Wei, M., Bhachawat, V., Hineman, M., Koval, R., Gorman, J., Kau, D., Tewg, J., Wang, L., Hajra, M., Schroeder, P., Woo, B.J., Fazio, A.

Year:

2007

Language:

english

File:

PDF, 689 KB

english, 2007

6

Physical and electrical properties of Ta–N, Mo–N, and W–N electrodes on HfO[sub 2] high-k gate dielectric

Lu, Jiang, Kuo, Yue, Chatterjee, Somenath, Tewg, Jun-Yen

Journal:

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures

Year:

2006

Language:

english

File:

PDF, 920 KB

english, 2006

7

Hafnium-Doped Tantalum Oxide High-k Gate Dielectrics

Lu, Jiang, Kuo, Yue, Tewg, Jun-Yen

Journal:

Journal of The Electrochemical Society

Year:

2006

Language:

english

File:

PDF, 325 KB

english, 2006

8

Suppression of Crystallization of Tantalum Oxide Thin Film by Doping with Zirconium

Tewg, Jun-Yen, Kuo, Yue, Lu, Jiang

Journal:

Electrochemical and Solid-State Letters

Year:

2005

Language:

english

File:

PDF, 449 KB

english, 2005

9

Electrical and Physical Characterization of Zirconium-Doped Tantalum Oxide Thin Films

Tewg, Jun-Yen, Kuo, Yue, Lu, Jiang, Schueler, Bruno W.

Journal:

Journal of The Electrochemical Society

Year:

2004

Language:

english

File:

PDF, 244 KB

english, 2004

10

Engineering the nm-thick Interface Layer Formed Between a High-k Film and Silicon

Lu, J., Tewg, J. -Y., Kuo, Y.

Journal:

MRS Proceedings

Year:

2004

Language:

english

File:

PDF, 1.08 MB

english, 2004

11

Influence of a 5 Å Tantalum Nitride Interface Layer on Dielectric Properties of Zirconium-Doped Tantalum Oxide High-k Films

Tewg, Jun-Yen, Kuo, Yue, Lu, Jiang, Schueler, Bruno W.

Journal:

Journal of The Electrochemical Society

Year:

2005

Language:

english

File:

PDF, 987 KB

english, 2005

12

Zirconium-Doped Tantalum Oxide Gate Dielectric Films Integrated with Molybdenum, Molybdenum Nitride, and Tungsten Nitride Gate Electrodes

Tewg, Jun-Yen, Kuo, Yue, Lu, Jiang

Journal:

Journal of The Electrochemical Society

Year:

2005

Language:

english

File:

PDF, 477 KB

english, 2005

13

Effect of long-term He–Ne laser light exposure and subsequent annealing on hydrogenated amorphous silicon pin photodiodes

Ristova, M, Kuo, Y, Lee, H H, Tewg, J Y

Journal:

Semiconductor Science and Technology

Year:

2005

Language:

english

File:

PDF, 249 KB

english, 2005

14

Tantalum Nitride Interface Layer Influence on Dielectric Properties of Hafnium Doped Tantalum Oxide High Dielectric Constant Thin Films

Y. Kuo, J. Lu, J. Tewg

Year:

2003

Language:

english

File:

PDF, 102 KB

english, 2003

15

SPIE Proceedings [SPIE Photomask Technology - Monterey, CA (Monday 8 September 2003)] 23rd Annual BACUS Symposium on Photomask Technology - Passivation of the 157-nm pellicle with nanometer thin films

Kuo, Yue, Lu, Jiang, Tewg, Jun-Yen, Zimmerman, Paul A., Kimmel, Kurt R., Staud, Wolfgang

Year:

2003

Language:

english

File:

PDF, 103 KB

english, 2003

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